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Research Scientist Semiconductor Etch

KLA, Ann Arbor, MI, United States
Employer Description

Calling the adventurers ready to join a company that's pushing the limits of nanotechnology to keep the digital revolution rolling. At KLA-Tencor, we're making technology advancements that are bigger—and tinier—than the world has ever seen.

Who are we?  We research, develop, and manufacture the world's most advanced inspection and measurement equipment for the semiconductor and nanoelectronics industries. We enable the digital age by pushing the boundaries of technology, creating tools capable of finding defects smaller than a wavelength of visible light. We create smarter processes so that technology leaders can manufacture high-performance chips—the kind in that phone in your pocket, the tablet on your desk and nearly every electronic device you own—faster and better. We're passionate about creating solutions that drive progress and help people do what wouldn't be possible without us.  The future is calling. Will you answer?

Job Description

Group / Division

Enabling the movement toward advanced chip design, KLA's Measurement, Analytics and Control group (MACH) is looking for the best and brightest research scientists, software engineers, application development engineers and senior product technology process engineers to join our team.

The MACH team's mission is to collaborate with our customers to innovate technologies and solutions that detect and control highly complex process variations—at their source—rather than compensate for them at later stages of the manufacturing process.

With over 40 years of semiconductor process control experience, chipmakers around the globe rely on KLA to ensure that their fabs ramp next-generation devices to volume production quickly and cost-effectively. Our MACH team develops leading-edge solutions for patterning process analytics and control technologies, thereby providing customers with critical insight at the feature level, field level and cross-wafer analysis. Our teams also develop advanced modeling simulation, data analytics and process control modeling technologies.

As a member of the MACH team, you’ll be joining the most sophisticated and successful process-control company in the semiconductor industry--working across functions to solve the most complex technical problems in the digital age.



In this position, you will have several responsibilities.  First, familiarize with etch patterning processing commercial software and provide feedback to enable solving customer high value problems.  Second, work with customers to develop applications for computational patterning and identify new applications to support for both R&D and fab use-cases. Potential applications include rigorous OPC (optical proximity correction), optimizing patterning processes, and control of new patterning schemes.  Third, leverage etch process knowledge to develop customized etch patterning surface chemistry data by calibrating to data for various applications and validate the same including image-based metrology such as SEM images.

Job Requirements


Semiconductor fabrication process background including developing etch and deposition processes for patterning applications.

Familiarity with processing hardware and typical process windows to optimize process performance is preferred.

Nice to have are the below experiences/skills:
• Ability to invent, develop and implement new algorithms and ideas
• Comfortable with working on Linux platform
• Hands-on experience with products such as Python, TensorFlow
• Excellent written and verbal communication skills.
• Ability to work both independently and in a team environment.


Minimum Qualifications

  • Doctorate (Academic) OR 
  • Master's Level Degree with at least 2 years of experience. OR
  • Bachelor's Level Degree with at least 7 years of experience.


KLA is an Equal Opportunity Employer. Applicants will be considered for employment without regard to age, race, color, religion, sex, sexual orientation, gender identity, national origin, protected veteran status, disability, or any other characteristics protected by applicable law.

07 August 2019
06 September 2019
Sensing, Monitoring, Measurement, and Control