Group / Division
Enabling the movement toward advanced chip design, KLA's Measurement, Analytics and Control group (MACH) is looking for the best and brightest research scientists, software engineers, application development engineers and senior product technology process engineers to join our team.
The MACH team's mission is to collaborate with our customers to innovate technologies and solutions that detect and control highly complex process variations—at their source—rather than compensate for them at later stages of the manufacturing process.
With over 40 years of semiconductor process control experience, chipmakers around the globe rely on KLA to ensure that their fabs ramp next-generation devices to volume production quickly and cost-effectively. Our MACH team develops leading-edge solutions for patterning process analytics and control technologies, thereby providing customers with critical insight at the feature level, field level and cross-wafer analysis. Our teams also develop advanced modeling simulation, data analytics and process control modeling technologies.
As a member of the MACH team, you’ll be joining the most sophisticated and successful process-control company in the semiconductor industry--working across functions to solve the most complex technical problems in the digital age.
In this position, you will have several responsibilities. First, familiarize with etch patterning processing commercial software and provide feedback to enable solving customer high value problems. Second, work with customers to develop applications for computational patterning and identify new applications to support for both R&D and fab use-cases. Potential applications include rigorous OPC (optical proximity correction), optimizing patterning processes, and control of new patterning schemes. Third, leverage etch process knowledge to develop customized etch patterning surface chemistry data by calibrating to data for various applications and validate the same including image-based metrology such as SEM images.